CISRI International offers various of sputtering targets for FPD applications such as TN, STN, TFT-LCD, FED, PDP, OLED and CF(Color Filter).
These targets include: Cr, Mo, AZO, Al, AG, Ta, W, etc.
The largest HIP equipment in China is located in CISRI, which can be used to produce the high purity Cr target with length over 1800mm. Furthermore, CISRI owns the largest vacuum sintering furnace with high temperature, which can be used to produce the high purity Mo target with large dimension.
Properies of Mo and W Target |
Purity | >99.95% ~ 99.98% (3N5 ~ 3N8) |
Relative Density | >99% |
Grain Size | <100µm |
Dimension | Max Length: 2000mm; Max Dia: 500mm |
Other special specifications are available on customers' request. |